KIST Develops Nanomaterial Technology for Future Mobility (November 8, 2022)
- Date : 2022-11-08
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International Cooperation Team
KIST Develops Nanomaterial Technology for Future Mobility
The National Research Council of Science and Technology (NST; Chairperson: Bok Chul Kim) and the Korea Institute of Science and Technology (KIST; President: Seok-Jin Yoon) held a signboard hanging ceremony for SEIF (Solutions to Electromagnetic Interference in Future-Mobility) at KIST's Seoul headquarters on November 8, 2022.
More than 40 notable figures attended the ceremony, including Seok-Jin Yoon, President of KIST; Bok Chul Kim, Chairperson of NST; Nak-Kyu Lee, President of the Korea Institute of Industrial Technology (KITECH), Se-jong Kim, President of the Korea Testing Laboratory (KTL), Jung-Hwan Lee, President of the Korea Institute of Materials Science (KIMS), and Sang-Ryool Lee, President of the Korea Aerospace Institute (KARI).
Under the general management of KIST, SEIF will collaborate with government-funded research institutes such as KITECH, KIMS, and KARI, as well as KTL, the Korea Automotive Technology Institute, the Korea Electronics Technology Institute, 3 universities, and 6 companies to conduct a six-year, 45 billion won research effort with the goal of "securing and commercializing the world's best electromagnetic control solutions materials and fundamental parts technologies to preemptively respond to future mobility demand."
Jong-Hyeok Park, the Project Director at KIST overseeing the research, said, "We plan to support future mobility implementation through research on nanomaterials-based electromagnetic solution systems that can be applied to explosive future mobility markets such as autonomous vehicles and urban air transportation."
Seok-Jin Yoon, President of KIST, stated, "This project is essential research to prepare us for our future society and has high policy consistency," adding, "We plan to actively support the next generation of national growth engines and job creation through the development of fundamental technologies."